COMPUTER-AIDED PROXIMITY EFFECT CORRECTION SYSTEM IN PHOTOLITHOGRAPHY

被引：1
|
作者：
HIRAI, Y
NOMURA, N
MISAKA, A
HAYAMA, S
YAMASHITA, K
HARAFUJI, K
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1989年 / 28卷 / 10期
关键词：
D O I：
10.1143/JJAP.28.2049
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：2049 / 2052
页数：4
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