ULTRAVIOLET-OZONE CLEANING OF SILICON SURFACES STUDIED BY AUGER-SPECTROSCOPY

被引：29
|
作者：
KRUSOR, BS [1 ]
BIEGELSEN, DK [1 ]
YINGLING, RD [1 ]
ABELSON, JR [1 ]
机构：
[1] STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 01期
关键词：
D O I：
10.1116/1.584436
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：129 / 130
页数：2
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