DEPTH PROFILING OF OXYGEN IN AMORPHOUS-GERMANIUM FILMS BY SECONDARY ION MASS-SPECTROMETRY

被引：7

作者：

NAKHODKIN, NG ^{[1
]}

BARDAMID, AF ^{[1
]}

SHALDERVAN, AI ^{[1
]}

CHENAKIN, SP ^{[1
]}

机构：

[1] ACAD SCI UKSSR,INST MET PHYS,KIEV,UKSSR

来源：

THIN SOLID FILMS | 1980年 / 65卷 / 02期

关键词：

D O I：

10.1016/0040-6090(80)90255-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：209 / 219

页数：11

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