STRESS IN SILICON FILMS DEPOSITED HETEROEPITAXIALLY ON INSULATING SUBSTRATES WITH PARTICULAR REFERENCE TO CORUNDUM

被引：7
|
作者：
JEFKINS, DM
机构：
来源：
JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1970年 / 3卷 / 05期
关键词：
D O I：
10.1088/0022-3727/3/5/318
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：770 / &
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