ELECTRICAL ACTIVATION OF LOW-FLUENCE BORON IMPLANTATION IN SILICON STUDIED BY PCV IN COMBINATION WITH SIMS

被引：2
|
作者：
KEMPF, J
机构：
来源：
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1988年 / 45卷 / 01期
关键词：
D O I：
10.1007/BF00618767
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：77 / 81
页数：5
相关论文
共 50 条
  • [1] Electrical activation in silicon-on-insulator after low energy boron implantation
    Saavedra, AF
    Jones, KS
    Law, ME
    Chan, KK
    Jones, EC
    JOURNAL OF APPLIED PHYSICS, 2004, 96 (04) : 1891 - 1898
  • [2] PRIMARY DEFECTS IN LOW-FLUENCE ION-IMPLANTED SILICON
    WANG, KL
    APPLIED PHYSICS LETTERS, 1980, 36 (01) : 48 - 50
  • [3] LASER ANNEALING OF LOW-FLUENCE ION-IMPLANTED SILICON
    PRUSSIN, S
    VONDEROHE, W
    JOURNAL OF APPLIED PHYSICS, 1980, 51 (07) : 3853 - 3859
  • [4] BORON IMPLANTATION IN SI - CHANNELING EFFECTS STUDIED BY SIMS AND SIMULATION
    TIAN, CS
    GARA, S
    HOBLER, G
    STINGEDER, G
    MIKROCHIMICA ACTA, 1992, 107 (3-6) : 161 - 169
  • [5] Cutaneous immunological activation elicited by a low-fluence pulsed dye laser
    Omi, T
    Kawana, S
    Sato, S
    Takezaki, S
    Honda, M
    Igarashi, T
    Hankins, RW
    Bjerring, P
    Thestrup-Pedersen, K
    BRITISH JOURNAL OF DERMATOLOGY, 2005, 153 : 57 - 62
  • [6] SIMS STUDY OF IMPLANTATION-INDUCED BORON REDISTRIBUTION IN SILICON
    WONG, SP
    LO, VC
    LAM, YW
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1994, 90 (1-4): : 487 - 490
  • [7] Effect of hydrogen implantation on low-temperature activation of boron in silicon
    Lin, Jui-Chang
    Lee, Bo-Wen
    Chang, Ruey-Dar
    Chu, Che-Men
    Woon, Wei-Yen
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2021, 505 : 58 - 63
  • [8] Dopant redistribution and electrical activation in silicon following ultra-low energy boron implantation and excimer laser annealing
    Whelan, S
    La Magna, A
    Privitera, V
    Mannino, G
    Italia, M
    Bongiorno, C
    Fortunato, G
    Mariucci, L
    PHYSICAL REVIEW B, 2003, 67 (07)
  • [9] Active waveguides by low-fluence carbon implantation in Nd3+-doped fluorophosphate glasses
    Liu, Chun-Xiao
    Luo, Zhe-Yuan
    Li, Yu-Wen
    Chen, Meng
    Xu, Jun
    Fu, Li-Li
    Yu, Ke-Han
    Zheng, Rui-Lin
    Zhou, Zhi-Guang
    Li, Wei-Nan
    Guo, Hai-Tao
    Lin, She-Bao
    Wei, Wei
    MODERN PHYSICS LETTERS B, 2016, 30 (02):
  • [10] Periodic nanostructure formation on silicon irradiated with multiple low-fluence femtosecond laser pulses in water
    Miyazaki, Kenzo
    Miyaji, Godai
    LASER ASSISTED NET SHAPE ENGINEERING 7 (LANE 2012), 2012, 39 : 674 - 682
12345