A COMPARATIVE-STUDY OF THE DEPOSITION CONDITIONS IN THE PLASMA-ASSISTED DEPOSITION OF GALLIUM NITRIDE THIN-FILMS

被引：14
|
作者：
MATSUSHITA, K
MATSUNO, Y
HARIU, T
SHIBATA, Y
机构：
来源：
THIN SOLID FILMS | 1981年 / 80卷 / 1-3期
关键词：
Compendex;
D O I：
10.1016/0040-6090(81)90229-7
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
SEMICONDUCTING GALLIUM COMPOUNDS
引用
收藏
页码：243 / 247
页数：5
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