PHOTORESIST DESIGN FOR SUB-MICRON OPTICAL LITHOGRAPHY - APPLICATION OF POLYPHOTOLYSIS

被引：0
|
作者：
TREFONAS, P
DANIELS, BK
FISCHER, RL
机构：
[1] MONSANTO CO,ST LOUIS,MO 63166
[2] ASPECT SYST CORP,ST LOUIS,MO
来源：
SOLID STATE TECHNOLOGY | 1987年 / 30卷 / 08期
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
PHOTORESISTS
引用
收藏
页码：131 / 137
页数：7
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