DEVELOPMENT METHODS FOR SUB-MICRON OPTICAL LITHOGRAPHY

被引：5

作者：

ENDO, M

SASAGO, M

NAKAGAWA, H

UENO, A

NOMURA, N

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1989年 / 28卷 / 10期

关键词：

D O I：

10.1143/JJAP.28.2035

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2035 / 2037

页数：3

共 50 条

[1] SUB-MICRON OPTICAL LITHOGRAPHY
ROUSSEL, JM
[J]. PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1981, 275 : 9 - 16
[2] SUB-MICRON LITHOGRAPHY
BLAIS, PD
[J]. OPTICAL ENGINEERING, 1983, 22 (02) : 175 - 175
[3] OPTICAL PROJECTION LITHOGRAPHY IN THE SUB-MICRON RANGE
ARDEN, W
KELLER, H
MADER, L
[J]. SOLID STATE TECHNOLOGY, 1983, 26 (07) : 143 - 150
[4] RESIST SCHEMES FOR SUB-MICRON OPTICAL LITHOGRAPHY
COOPMANS, F
[J]. JOURNAL DE PHYSIQUE, 1988, 49 (C-4): : 723 - 734
[5] MASK BIAS IN SUB-MICRON OPTICAL LITHOGRAPHY
MACK, CA
KAUFMAN, PM
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06): : 2213 - 2220
[6] MULTILAYER RESIST TECHNIQUE FOR SUB-MICRON OPTICAL LITHOGRAPHY
TING, CH
LIAUW, KL
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04): : 1225 - 1234
[7] DESIRE - A NEW ROUTE TO SUB-MICRON OPTICAL LITHOGRAPHY
COOPMANS, F
ROLAND, B
[J]. SOLID STATE TECHNOLOGY, 1987, 30 (06) : 93 - 99
[8] SUB-MICRON OPTICAL LITHOGRAPHY USING INORGANIC RESISTS
LAVINE, JM
LIS, SA
MASTERS, JI
[J]. PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1983, 393 : 41 - 48
[9] CONTRAST ENHANCEMENT - A ROUTE TO SUB-MICRON OPTICAL LITHOGRAPHY
WEST, PR
GRIFFING, BF
[J]. PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1983, 394 : 33 - 38
[10] SUB-MICRON LITHOGRAPHY TECHNIQUES
LAWES, RA
[J]. APPLIED SURFACE SCIENCE, 1989, 36 (1-4) : 485 - 499