INFLUENCE OF TEMPERATURE-GRADIENTS ON PARTIAL PRESSURES IN A LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION REACTOR

被引:6
|
作者
OOSTERLAKEN, TGM [1 ]
LEUSINK, GJ [1 ]
JANSSEN, GCAM [1 ]
RADELAAR, S [1 ]
KUIJLAARS, KJ [1 ]
KLEIJN, CR [1 ]
VANDENAKKER, HEA [1 ]
机构
[1] DELFT UNIV TECHNOL, JM BURGERS CTR FLUID DYNAM, KRAMERS LAB, 2628 BW DELFT, NETHERLANDS
关键词
D O I
10.1063/1.357495
中图分类号
O59 [应用物理学];
学科分类号
摘要
Measurements and calculations of the influence of temperature gradients on the partial pressures of the gas species in a cold-wall chemical-vapor-deposition reactor are presented. The experiments were performed at low pressures (300-500 Pa total pressure) and gas mixtures consisting of hydrogen, nitrogen, and tetrafluoromethane. The partial pressures were determined by Raman spectroscopy. The Soret effect (or thermal diffusion) has a large influence on the partial pressures of heavy gases in the vicinity of the heated wafer. In some cases a decrease in partial pressure of 20% compared to the inlet partial pressures was observed. Numerical calculations were performed to predict the behavior of the gas mixture. For mixtures under investigation the gas temperatures as well as the changes in partial pressures due to the Soret effect were predicted correctly.
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页码:3130 / 3139
页数:10
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