CHARACTERIZATION OF PORCELAIN ENAMEL SUBSTRATES FOR ELECTRONIC APPLICATION

被引:0
|
作者
HUGHES, EW [1 ]
LIM, C [1 ]
机构
[1] FERRO CORP,CLEVELAND,OH 44114
来源
AMERICAN CERAMIC SOCIETY BULLETIN | 1980年 / 59卷 / 03期
关键词
D O I
暂无
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:372 / 373
页数:2
相关论文
共 50 条
  • [11] PORCELAIN ENAMEL
    HARRISON, WN
    PROCEEDINGS-AMERICAN SOCIETY FOR TESTING AND MATERIALS, 1951, 51 : 276 - 277
  • [12] Preparation and application of a new porcelain enamel cooling equipment
    Cao, Guo-Min
    Wang, Sheng-Rong
    Liu, Ji-Yan
    Xiandai Huagong/Modern Chemical Industry, 2003, 23 (03): : 48 - 50
  • [13] Proper care of porcelain enamel powder for electrostatic application
    Evele, Holger F.
    Ceramic Engineering and Science Proceedings, 2000, 21 (05): : 125 - 126
  • [14] APPLICATION OF NEW TECHNIQUES TO STUDY OF PORCELAIN ENAMEL ADHERENCE
    UHER, JF
    SPENCERS.GH
    AMERICAN CERAMIC SOCIETY BULLETIN, 1971, 50 (04): : 381 - &
  • [15] PORCELAIN ENAMELED SUBSTRATES FOR ELECTRONIC APPLICATIONS - DESIGN CRITERIA
    MISTLER, RE
    AMERICAN CERAMIC SOCIETY BULLETIN, 1982, 61 (08): : 806 - 806
  • [16] THE EFFECTS OF DEW POINT ON PORCELAIN ENAMEL POWDER COATING APPLICATION
    O'Connor, Frank J., II
    67TH PORCELAIN ENAMEL INSTITUTE TECHNICAL FORUM, PROCEEDINGS, 2006, 26 (09): : 79 - 87
  • [17] PORCELAIN ENAMEL ON ALUMINUM
    HUBBELL, DS
    MATERIALS RESEARCH AND STANDARDS, 1967, 7 (07): : 291 - &
  • [18] CHARACTERIZATION OF CONTINUOUS CLEANING PORCELAIN ENAMEL BY EVAPORATIVE RATE ANALYSIS
    SCHERPER.DE
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1973, : 101 - +
  • [19] THEORETICAL APPROACHES FOR THE APPLICATION OF PORCELAIN ENAMEL FOR PASSIVE THERMAL CONTROL
    LEGGETT, H
    LEVIN, H
    AMERICAN CERAMIC SOCIETY BULLETIN, 1980, 59 (03): : 372 - 372
  • [20] CHALLENGE TO PORCELAIN ENAMEL
    FUSSELL, LE
    LEVER, RC
    CERAMIC AGE, 1967, 83 (01): : 28 - &