VIBRATIONAL-ENERGY RELAXATION DYNAMICS OF SI-H STRETCHING MODES ON STEPPED H/SI(111) 1X1 SURFACES

被引:4
|
作者
SUN, YC [1 ]
GAI, HD [1 ]
VOTH, GA [1 ]
机构
[1] UNIV PENN, DEPT CHEM, PHILADELPHIA, PA 19104 USA
基金
美国国家科学基金会;
关键词
D O I
10.1016/0301-0104(95)00270-7
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The vibrational energy relaxation rates of excited Si-H stretching modes on the monohydride step of miscut H/Si(111) 1 x 1 surfaces are calculated using Bloch-Redfield theory combined with classical molecular dynamics (MD) simulation. The structure and vibrational frequencies of the surface are first investigated using the Car-Paninello ab initio MD method. The calculated Si-Si-H bending frequencies and relaxed structures are then used to refine the empirical potential for the classical MD simulations. The lifetime of the excited Si-H stretching mode at the step is found to be shorter than the modes on the terrace. Both the magnitude and the trend of the calculated results agree well with the experimental measurement on the 9 degrees monohydride stepped surface. The vibrational relaxation rate of the Si-H stretching modes on the 15 degrees monohydride stepped surface are also calculated and predicted to have a slightly shorter lifetime than for the 9 degrees surface.
引用
收藏
页码:357 / 368
页数:12
相关论文
共 50 条
  • [41] A classical molecular dynamics study of the vibrational dynamics of the H/C(111)-(1x1) system
    Smirnov, KS
    Ermoshin, VA
    Bougeard, D
    [J]. CHEMICAL PHYSICS, 1998, 230 (01) : 57 - 66
  • [42] IR studies of Si-H bond-bending vibrational modes in Si
    Tokmoldin, SZ
    Mukashev, BN
    [J]. DEFECTS IN SEMICONDUCTORS - ICDS-19, PTS 1-3, 1997, 258-2 : 223 - 228
  • [43] COMPARISON OF THE SI(111) (7X7) AND (1X1) SURFACES
    KOBAYASHI, H
    EDAMOTO, K
    ONCHI, M
    NISHIJIMA, M
    [J]. SOLID STATE COMMUNICATIONS, 1982, 44 (10) : 1449 - 1453
  • [44] COHERENT PROCESSES AT SURFACES - FREE-INDUCTION DECAY AND PHOTON-ECHO OF THE SI-H STRETCHING VIBRATION FOR H/SI(111)
    GUYOTSIONNEST, P
    [J]. PHYSICAL REVIEW LETTERS, 1991, 66 (11) : 1489 - 1492
  • [45] Electronic structure of the ideally H-terminated Si(111)-(1X1) surface
    Gallego, S
    Avila, J
    Martin, M
    Blase, X
    Taleb, A
    Dumas, P
    Asensio, MC
    [J]. PHYSICAL REVIEW B, 2000, 61 (19): : 12628 - 12631
  • [46] THE ROLE OF KINKS IN THE SI-H VIBRATIONAL-SPECTRUM OF VICINAL SI(111)-[(1)OVER-BAR(1)OVER-BAR-2] SURFACES
    JAKOB, P
    CHABAL, YJ
    RAGHAVACHARI, K
    [J]. JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1993, 64-5 : 59 - 66
  • [47] Investigation of light initiated oxidation of hydrogen passivated silicon surfaces:: Hx-Si(100) and H-Si(111) (1X1)
    Morse, KA
    [J]. SILICON MATERIALS-PROCESSING, CHARACTERIZATION AND RELIABILITY, 2002, 716 : 279 - 284
  • [48] Absorption strengths of Si-H vibrational modes in hydrogenated silicon
    Beyer, W
    Ghazala, MSA
    [J]. AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY-1998, 1998, 507 : 601 - 606
  • [49] SELF-ENERGY EFFECTS ON THE SURFACE-STATE ENERGIES OF H-SI(111)1X1
    BLASE, X
    ZHU, XJ
    LOUIE, SG
    [J]. PHYSICAL REVIEW B, 1994, 49 (07): : 4973 - 4980
  • [50] FORMATION OF SI(111)-(1X1)CL
    BOLAND, JJ
    VILLARRUBIA, JS
    [J]. PHYSICAL REVIEW B, 1990, 41 (14): : 9865 - 9870