SuPR-NaP Technique for Printing Ultrafine Silver Electrodes and its Use for Low-Voltage Operation of Organic Thin-Film Transistors

被引:0
|
作者
Kitahara, G. [1 ,2 ]
Aoshima, K. [1 ,2 ]
Tsutsum, J. [2 ]
Minemawari, H. [2 ]
Arai, S. [1 ]
Hasegawa, T. [1 ,2 ]
机构
[1] Univ Tokyo, Dept Appl Phys, Bunkyo Ku, 7-3-1 Hongo, Tokyo 1138656, Japan
[2] Natl Inst Adv Ind Sci & Technol, Tsukuba Cent 5,1-1-1 Higashi, Tsukuba, Ibaraki 3058565, Japan
来源
MRS ADVANCES | 2018年 / 3卷 / 49期
基金
日本科学技术振兴机构;
关键词
D O I
10.1557/adv.2018.423
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Recently, an epoch-making printing technology called "SuPR-NaP (Surface Photo-Reactive Nanometal Printing)" that allows easy, high-speed, and large-area manufacturing of ultrafine silver wiring patterns has been developed. Here we demonstrate low-voltage operation of organic thin-film transistors (OTFTs) composed of printed source/drain electrodes that are produced by the SuPR-NaP technique. We utilize an ultrathin layer of perfluompolymer, Cytop, that functions not only as a base layer for producing patterned reactive surface in the SuPR-NaP technique but also as an ultrathin gate dielectric layer of OT RS. By the use of 22 nm-thick Coop gate dielectric layer, we successfully operate polycrystalline pentacene OTI7s below 2 V with negligible hysteresis. We also observe the improvement of carrier injection by the surface modification of printed silver electrodes. We discuss that the SuPRNaP technique allows the production of high-capacitance gate dielectric layers as well as high-resolution printed silver electrodes, which provides promising bases for producing practical active-matrix OTFT backplanes.
引用
收藏
页码:2931 / 2936
页数:6
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