SILICON FILMS GROWTH IN VACUUM BY PYROLYSIS OF SILANE

被引：2
|
作者：
ALEXANDROV, LN [1 ]
EDELMAN, FL [1 ]
VOSKOBOINIKOV, VV [1 ]
机构：
[1] ACAD SCI USSR,INST SEMICOND PHYS,NOVOSIBIRSK 90,USSR
来源：
VACUUM | 1977年 / 27卷 / 03期
关键词：
D O I：
10.1016/0042-207X(77)90045-8
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：145 / 150
页数：6
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