THE PROPOSED EC-GROUP EXEMPTION FOR PATENT LICENSES - A COMPARISON WITH UNITED-STATES ANTITRUST-LAW

被引：0

作者：

HANDLER, M ^{[1
]}

BLECHMAN, MD ^{[1
]}

机构：

[1] KAYE SCHOLER FIERMAN HAYS & HANDLER, NEW YORK, NY USA

来源：

IIC-INTERNATIONAL REVIEW OF INDUSTRIAL PROPERTY AND COPYRIGHT LAW | 1980年 / 11卷 / 03期

关键词：

D O I：

暂无

中图分类号：

D9 [法律]; DF [法律];

学科分类号：

0301 ;

摘要：

引用

页码：295 / 323

页数：29

共 50 条

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