A METHOD TO REDUCE DEFLECTION ABERRATIONS IN ELECTRON-BEAM LITHOGRAPHY SYSTEMS

被引：3
|
作者：
KNAUER, W
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 04期
关键词：
D O I：
10.1116/1.571165
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1042 / 1047
页数：6
相关论文
共 50 条
  • [1] OCTOPOLE DEFLECTION SYSTEM FOR ELECTRON-BEAM LITHOGRAPHY
    OKAYAMA, S
    [J]. JOURNAL OF ELECTRON MICROSCOPY, 1985, 34 (03): : 202 - 203
  • [2] ON THE DESIGN OF ELECTRON-BEAM DEFLECTION SYSTEMS
    LENCOVA, B
    [J]. OPTIK, 1988, 79 (01): : 1 - 12
  • [3] DEFLECTION OF THE ELECTRON-BEAM IN ELECTRON-BEAM WELDING
    NAZARENKO, OK
    [J]. AUTOMATIC WELDING USSR, 1982, 35 (01): : 28 - 33
  • [4] DEFLECTION DISTORTION IN SCANNING ELECTRON-BEAM SYSTEMS
    CHANG, THP
    VISWANATHAN, R
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03): : 878 - 882
  • [5] ABERRATIONS AND TOLERANCES IN A DOUBLE-DEFLECTION ELECTRON-BEAM SCANNING SYSTEM
    THOMSON, MGR
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1156 - 1159
  • [6] COMPUTERIZED OPTIMIZATION OF ELECTRON-BEAM LITHOGRAPHY SYSTEMS
    CHU, HC
    MUNRO, E
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1053 - 1057
  • [7] NEW METHOD OF REGISTRATION FOR ELECTRON-BEAM LITHOGRAPHY
    AHMED, H
    HOARE, RD
    [J]. ELECTRONICS LETTERS, 1976, 12 (01) : 28 - 29
  • [8] ELECTRON-BEAM LITHOGRAPHY
    HERRIOTT, DR
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03): : 781 - 785
  • [9] ELECTRON-BEAM LITHOGRAPHY
    EVERHART, TE
    [J]. BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1977, 22 (03): : 276 - 276
  • [10] Electron-beam lithography
    Oczos, Kazimierz
    [J]. Mechanik, 1988, 61 (07): : 341 - 343
12345