FUNDAMENTALS OF CHEMICAL VAPOR-DEPOSITION

被引：162

作者：

BRYANT, WA ^{[1
]}

机构：

[1] WESTINGHOUSE RES & DEV CTR, PITTSBURGH, PA 15222 USA

来源：

关键词：

D O I：

10.1007/BF00540843

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：1285 / 1306

页数：22

共 50 条

[41] CHEMICAL VAPOR-DEPOSITION OF CERAMIC MATERIALS
BLOCHER, JM
[J]. AMERICAN CERAMIC SOCIETY BULLETIN, 1980, 59 (03): : 329 - 329
[42] CHEMICAL VAPOR-DEPOSITION OF TANTALUM DIBORIDE
MOTOJIMA, S
SUGIYAMA, K
[J]. JOURNAL OF MATERIALS SCIENCE, 1979, 14 (12) : 2859 - 2864
[43] CHEMICAL VAPOR-DEPOSITION AND ISOTOPE SEPARATION
SEVERIN, PJ
LYDTIN, H
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (01) : 140 - 147
[44] MECHANISM OF CHEMICAL VAPOR-DEPOSITION OF SILICON
NISHIZAWA, J
SAITO, M
[J]. JOURNAL OF CRYSTAL GROWTH, 1981, 52 (APR) : 213 - 218
[45] CHEMICAL VAPOR-DEPOSITION OF TITANIUM DIBORIDE
TAKAHASHI, T
KAMIYA, H
[J]. JOURNAL OF CRYSTAL GROWTH, 1974, 26 (02) : 203 - 209
[46] CHEMICAL VAPOR-DEPOSITION FOR MICROELECTRONIC DEVICES
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[J]. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1985, 190 (SEP): : 77 - INE
[47] SELECTIVE ALUMINUM CHEMICAL VAPOR-DEPOSITION
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MASU, K
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1992, 10 (04): : 856 - 862
[48] CHEMICAL VAPOR-DEPOSITION ADVANCES SUPERCONDUCTORS
SWINBANKS, D
[J]. NATURE, 1988, 332 (6162) : 295 - 295
[49] TURBULENT JETS IN CHEMICAL VAPOR-DEPOSITION
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VANEECKHOUT, B
[J]. CHEMICAL ENGINEERING PROGRESS, 1988, 84 (12) : 18 - 22
[50] PRECURSORS FOR CHEMICAL VAPOR-DEPOSITION OF COPPER
KUMAR, R
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[J]. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1991, 201 : 256 - INOR