Van Der Waals forces in Helium

被引：17

|

作者：

Page, CH ^{[1
]}

机构：

[1] Yale Univ, Sloane Phys Lab, New Haven, CT USA

来源：

PHYSICAL REVIEW | 1938年 / 53卷 / 05期

关键词：

D O I：

10.1103/PhysRev.53.426

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

收藏

页码：426 / 430

页数：5

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