OPTICAL LITHOGRAPHY IN THE 1-MU-M LIMIT

被引：0

作者：

DOANE, DA ^{[1
]}

机构：

[1] RCA LABS, DAVID SARNOFF RES CTR, PRINCETON, NJ 08540 USA

来源：

SOLID STATE TECHNOLOGY | 1980年 / 23卷 / 08期

关键词：

Compendex;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

LITHOGRAPHY

引用

页码：101 / 114

页数：14

共 50 条

[41] SILVER IMPREGNATION METHOD FOR REACTIVE MICROGLIA IN 1-MU-M EPOXY SECTIONS
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