INSITU ELECTRICAL MEASUREMENT IN ION-IMPLANTED AMORPHOUS-SILICON FILMS

被引：1
|
作者：
OCHIAI, Y
UEMATSU, K
TAKITA, K
MASUDA, K
机构：
来源：
PHYSICS LETTERS A | 1981年 / 81卷 / 09期
关键词：
D O I：
10.1016/0375-9601(81)90455-2
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
收藏
页码：519 / 521
页数：3
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