PROPERTIES OF HIGH-PURITY SILICON EPITAXIAL LAYERS

被引：0
|
作者：
SUZUKI, T [1 ]
URA, M [1 ]
OGAWA, T [1 ]
机构：
[1] HITACHI LTD,HITACHI RES LAB,HITACHI,IBARAKI,JAPAN
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1973年 / 120卷 / 03期
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D O I：
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中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
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页码：C95 / &
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