STABILITY OF SPUTTERED MO/BN, W/BN, MO/B4C, AND W/B4C SOFT-X-RAY MULTILAYERS UNDER EXPOSURE TO MULTIPOLE-WIGGLER RADIATION

被引：9
|
作者：
YANAGIHARA, M [1 ]
MAYAMA, K [1 ]
GOTO, Y [1 ]
KUSUNOKI, I [1 ]
ASAOKA, S [1 ]
MAEZAWA, H [1 ]
机构：
[1] NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,TSUKUBA,IBARAKI 305,JAPAN
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT | 1993年 / 334卷 / 2-3期
关键词：
D O I：
10.1016/0168-9002(93)90832-3
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
The effect of white wiggler radiation exposure on Mo/BN, W/BN, Mo/B4C, and W/B4C multilayers was evaluated by comparing Soft X-Tay reflectance. All samples were prepared by magnetron sputtering onto SiC substrates. The choice of combinations was based upon thermal annealing tests for Mo/X and W/X (X = C, Si, BN, and B4C) multilayers, prior to any exposure tests. On exposure under radiation power density of approximately 2.3 W/mm2 for ten minutes the Mo/BN and W/BN samples underwent approximately 20% and approximately 65% degradation in reflectance, while the Mo/B4C and W/B4C samples were almost destroyed. Of the four samples the Mo/BN multilayer was the most stable. The result was qualitatively consistent with that of the anneal tests.
引用
收藏
页码：638 / 642
页数：5
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