EFFECT OF SUBSTRATE-TEMPERATURE ON THE FORMATION OF SHALLOW SILICIDE CONTACTS ON SI USING PD-W AND PT-W ALLOYS

被引：24

|

作者：

EIZENBERG, M

OTTAVIANI, G

TU, KN

机构：

来源：

APPLIED PHYSICS LETTERS | 1980年 / 37卷 / 01期

关键词：

D O I：

10.1063/1.91713

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：87 / 89

页数：3

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