EFFECT OF SUBSTRATE-TEMPERATURE ON THE FORMATION OF SHALLOW SILICIDE CONTACTS ON SI USING PD-W AND PT-W ALLOYS

被引：24
|
作者：
EIZENBERG, M
OTTAVIANI, G
TU, KN
机构：
来源：
APPLIED PHYSICS LETTERS | 1980年 / 37卷 / 01期
关键词：
D O I：
10.1063/1.91713
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：87 / 89
页数：3
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