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DISTRIBUTION OF LIGHT-INDUCED DEFECT STATES IN UNDOPED AMORPHOUS-SILICON
被引:5
|
作者
:
HATTORI, K
论文数:
0
引用数:
0
h-index:
0
机构:
Faculty of Engineering Science, Osaka University, Toyonaka
HATTORI, K
ANZAI, M
论文数:
0
引用数:
0
h-index:
0
机构:
Faculty of Engineering Science, Osaka University, Toyonaka
ANZAI, M
OKAMOTO, H
论文数:
0
引用数:
0
h-index:
0
机构:
Faculty of Engineering Science, Osaka University, Toyonaka
OKAMOTO, H
HAMAKAWA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
Faculty of Engineering Science, Osaka University, Toyonaka
HAMAKAWA, Y
机构
:
[1]
Faculty of Engineering Science, Osaka University, Toyonaka
来源
:
JOURNAL OF APPLIED PHYSICS
|
1995年
/ 77卷
/ 07期
关键词
:
D O I
:
10.1063/1.358716
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
Distribution of light-induced defect states in undoped amorphous silicon has been studied by using the modulated photoconductivity spectroscopy technique. The experimental results show that a large increase of the neutral defect states occurs, and the positively charged defect states grow particularly in the midgap energy range. The qualitative features of the measured energy distribution agree well with the theoretical prediction from the current defect formation model, although a quantitative comparison with respect to the magnitude of density-of-states reveals a discrepancy between theory and experiment. © 1995 American Institute of Physics.
引用
收藏
页码:2989 / 2992
页数:4
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