PROFILE CONTROL BY REACTIVE SPUTTER ETCHING

被引：153

|

作者：

LEHMANN, HW

WIDMER, R

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1978年 / 15卷 / 02期

关键词：

D O I：

10.1116/1.569581

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：319 / 326

页数：8

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