CHANNELING OF FISSION FRAGMENTS IN SILICON

被引：0

作者：

DEMICHELIS, F ^{[1
]}

LISCIA, R ^{[1
]}

TARTAGLIA, A ^{[1
]}

机构：

[1] POLITECN TORINO, IST FIS SPERIMENTALE, TURIN, ITALY

来源：

LETTERE AL NUOVO CIMENTO | 1972年 / 5卷 / 14期

关键词：

D O I：

10.1007/BF02777990

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：918 / 920

页数：3

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