DEPOSITION OF SILVER FILMS BY PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION

被引：33
|
作者：
OEHR, C
SUHR, H
机构：
来源：
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1989年 / 49卷 / 06期
关键词：
D O I：
10.1007/BF00616995
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
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页码：691 / 696
页数：6
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