HALL-EFFECT AND INFRARED-ABSORPTION MEASUREMENTS ON NITROGEN DONORS IN 6H-SILICON CARBIDE

被引:164
|
作者
SUTTROP, W
PENSL, G
CHOYKE, WJ
STEIN, R
LEIBENZEDER, S
机构
[1] UNIV ERLANGEN NURNBERG,INST ANGEW PHYS,W-8520 ERLANGEN,GERMANY
[2] SIEMENS AG,RES LABS,W-8520 ERLANGEN,GERMANY
关键词
D O I
10.1063/1.352318
中图分类号
O59 [应用物理学];
学科分类号
摘要
Hall effect and infrared absorption measurements of n-type silicon carbide of the 6H polytype are employed to investigate the energy position of the ground state and excited states of the nitrogen donor. A donor model is proposed that assigns four series of absorption lines to electronic transitions of three donor species residing at three inequivalent lattice sites (h,k1,k2). A valley-orbit splitting of 12.6 meV is determined for donors on the hexagonal site h. For 2p0, 2p+/-, 3p0, and 3p+/- excited states, the effective-mass approximation is found to hold within experimental errors assuming a transverse and longitudinal effective electron mass of m perpendicular-to = (0.24 +/- 0.01) m0 and m parallel-to = (0.34 +/- 0.02) m0, respectively.
引用
收藏
页码:3708 / 3713
页数:6
相关论文
共 50 条
  • [21] Beryllium implantation induced deep levels in 6H-silicon carbide
    Chen, XD
    Fung, S
    Beling, CD
    Gong, M
    Henkel, T
    Tanoue, H
    Kobayashi, N
    PHYSICA B-CONDENSED MATTER, 2001, 308 : 718 - 721
  • [22] 6H-Silicon carbide light emitting diodes and UV photodiodes
    Edmond, J
    Kong, H
    Suvorov, A
    Waltz, D
    Carter, C
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1997, 162 (01): : 481 - 491
  • [23] Vacancy in 6H-silicon carbide studied by slow positron beam
    Wang, HY
    Weng, HM
    Hang, DS
    Zhou, XY
    Ye, BJ
    Fan, YM
    Han, RD
    Ling, CC
    Hui, YP
    CHINESE PHYSICS LETTERS, 2003, 20 (07) : 1105 - 1108
  • [24] Photoluminescence characterization of beryllium-implanted 6H-silicon carbide
    Chen, XD
    Fung, S
    Beling, CD
    Huang, Y
    Li, Q
    Xu, SJ
    Gong, M
    Henkel, T
    Tanoue, H
    Kobayashi, N
    SOLID STATE COMMUNICATIONS, 2002, 121 (2-3) : 67 - 71
  • [25] Band gap states of V and Cr in 6H-silicon carbide
    N. Achtziger
    J. Grillenberger
    W. Witthuhn
    Applied Physics A, 1997, 65 : 329 - 331
  • [26] FORMATION AND CHARACTERIZATION OF COBALT 6H-SILICON CARBIDE SCHOTTKY CONTACTS
    LUNDBERG, N
    OSTLING, M
    APPLIED PHYSICS LETTERS, 1993, 63 (22) : 3069 - 3071
  • [27] On the presence of aluminum in thermally grown oxides on 6H-silicon carbide
    Sridevan, S
    McLarty, PK
    Baliga, BJ
    IEEE ELECTRON DEVICE LETTERS, 1996, 17 (03) : 136 - 138
  • [28] Band gap states of V and Cr in 6H-silicon carbide
    Achtziger, N
    Grillenberger, J
    Witthuhn, W
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1997, 65 (03): : 329 - 331
  • [29] OHMIC CONTACTS TO P-TYPE 6H-SILICON CARBIDE
    NENNEWITZ, O
    SPIESS, L
    BRETERNITZ, V
    APPLIED SURFACE SCIENCE, 1995, 91 (1-4) : 347 - 351
  • [30] Band gap states of V and Cr in 6H-silicon carbide
    Achtziger, N.
    Grillenberger, J.
    Witthuhn, W.
    Applied Physics A: Materials Science and Processing, 1997, A 65 (03): : 329 - 331