CORRELATION OF THE STRUCTURE AND ELECTRICAL-PROPERTIES OF ION-IMPLANTED AND LASER-ANNEALED SILICON

被引：42
|
作者：
CULLIS, AG
WEBBER, HC
CHEW, NG
机构：
来源：
APPLIED PHYSICS LETTERS | 1980年 / 36卷 / 07期
关键词：
D O I：
10.1063/1.91575
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：547 / 550
页数：4
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