MEASURED STOPPING POWERS OF O-16 AND F-19 IONS IN THIN ELEMENTAL FILMS

被引：18
|
作者：
SANTRY, DC [1 ]
WERNER, RD [1 ]
机构：
[1] ATOM ENERGY CANADA LTD,CHALK RIVER K0J 1J0,ONTARIO,CANADA
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1992年 / 69卷 / 2-3期
关键词：
D O I：
10.1016/0168-583X(92)96006-K
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
Absolute stopping values for 200-2000 keV ions of O-16 and F-19 were measured in targets of Be, C, Al, Si, Ni, Ti, Ag and Au by the thin-film transmission method. The results with estimated uncertainties of 5% are compared with semiempirical tabulations and measurements by others. The effective charge ratios of O-16 and F-19 ions.to hydrogen were again found to be a complex function of ion energy and the stopping medium.
引用
收藏
页码：167 / 173
页数：7
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