Many analytical techniques can provide information regarding the chemical state, structure, and properties of materials. This paper focuses on two; X-ray photoelectron spectroscopy (XPS) and X-ray absorption spectroscopy (XAS), and their application to the study of electrochemically formed oxide films. A brief review of the phenomena underlying these techniques is provided, along with a description of the commonly used means for implementing them. Their capabilities and limitations are discussed, with an emphasis on the study of passive film composition and oxidation state. A summary of the behavior of Cr in oxide films on Al-Cr alloys is presented as an example. The coordinated use of both XPS and XAS is shown to be useful in achieving full understanding of materials systems such as electrochemically formed oxide films.
机构:
Univ Fed Rio de Janeiro, Met & Mat Engn COPPE, BR-21941972 Rio De Janeiro, BrazilUniv Saskatchewan, Dept Phys & Engn Phys, Saskatoon, SK S7N 5E2, Canada
机构:
Univ Fed Rio de Janeiro, Met & Mat Engn COPPE, BR-21941972 Rio De Janeiro, BrazilUniv Saskatchewan, Dept Phys & Engn Phys, Saskatoon, SK S7N 5E2, Canada
机构:
RIKEN, SPring 8, Mikazuki, Hyogo 6795148, JapanRIKEN, SPring 8, Mikazuki, Hyogo 6795148, Japan
Taguchi, M.
Kueger, P.
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European Synchrotron Radiat Facil, F-38043 Grenoble, FranceRIKEN, SPring 8, Mikazuki, Hyogo 6795148, Japan
Kueger, P.
Parlebas, J. C.
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CNRS, IPCMS GEMME, F-67037 Strasbourg, FranceRIKEN, SPring 8, Mikazuki, Hyogo 6795148, Japan
Parlebas, J. C.
Kotani, A.
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RIKEN, SPring 8, Mikazuki, Hyogo 6795148, Japan
High Energy Accelerator Res Organizat, IMSS, Photon Factory, Tsukuba, Ibaraki 3050801, JapanRIKEN, SPring 8, Mikazuki, Hyogo 6795148, Japan