APPLICATION OF X-RAY SPECTROSCOPY TO THE STUDY OF ELECTROCHEMICALLY FORMED SURFACE OXIDE-FILMS

被引:2
|
作者
SCHROTT, AG
FRANKEL, GS
机构
关键词
D O I
10.1147/rd.372.0191
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
Many analytical techniques can provide information regarding the chemical state, structure, and properties of materials. This paper focuses on two; X-ray photoelectron spectroscopy (XPS) and X-ray absorption spectroscopy (XAS), and their application to the study of electrochemically formed oxide films. A brief review of the phenomena underlying these techniques is provided, along with a description of the commonly used means for implementing them. Their capabilities and limitations are discussed, with an emphasis on the study of passive film composition and oxidation state. A summary of the behavior of Cr in oxide films on Al-Cr alloys is presented as an example. The coordinated use of both XPS and XAS is shown to be useful in achieving full understanding of materials systems such as electrochemically formed oxide films.
引用
收藏
页码:191 / 206
页数:16
相关论文
共 50 条
  • [41] X-ray photoelectron spectroscopy and x-ray diffraction study of the thermal oxide on gallium nitride
    Wolter, SD
    Luther, BP
    Waltemyer, DL
    Onneby, C
    Mohney, SE
    Molnar, RJ
    APPLIED PHYSICS LETTERS, 1997, 70 (16) : 2156 - 2158
  • [42] USE OF X-RAY SPECTRAL ANALYSIS TO INVESTIGATE THE FORMATION MECHANISM OF DOPED OXIDE-FILMS ON SILICON
    DOMASHEVSKAYA, EP
    MITTOVA, IY
    YURAKOV, YA
    TEREKHOV, VA
    ANOKHIN, VZ
    BOIKO, VI
    INORGANIC MATERIALS, 1978, 14 (07) : 925 - 928
  • [43] Characterization of oxide layers formed on electrochemically treated Ti by using soft X-ray absorption measurements
    Wilks, R. G.
    Santos, E.
    Kurmaev, E. Z.
    Yablonskikh, M. V.
    Moewes, A.
    Kuromoto, N. K.
    Soares, G. A.
    JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 2009, 169 (01) : 46 - 50
  • [44] X-ray photoelectron spectroscopy of surface-treated indium-tin oxide thin films
    Kim, JS
    Ho, PKH
    Thomas, DS
    Friend, RH
    Cacialli, F
    Bao, GW
    Li, SFY
    CHEMICAL PHYSICS LETTERS, 1999, 315 (5-6) : 307 - 312
  • [45] X-ray photoelectron spectroscopy and spectral transmittance study of stoichiometry in sputtered vanadium oxide films
    Krishna, MG
    Debauge, Y
    Bhattacharya, AK
    THIN SOLID FILMS, 1998, 312 (1-2) : 116 - 122
  • [46] APPLICATION OF X-RAY PHOTOELECTRON-SPECTROSCOPY IN THE STUDY OF MINERAL SURFACE-CHEMISTRY
    KOPPELMAN, M
    DILLARD, JG
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1979, (APR): : 153 - 153
  • [47] Theoretical study of X-ray photoemission, X-ray absorption and resonant X-ray emission spectroscopy of Mn films on Ag
    Taguchi, M.
    Kueger, P.
    Parlebas, J. C.
    Kotani, A.
    PHYSICA SCRIPTA, 2005, T115 : 122 - 124
  • [48] INVESTIGATION OF SURFACE OXIDE LAYERS BY X-RAY APPEARANCE POTENTIAL SPECTROSCOPY
    RAMACHANDRAN, KN
    COX, CD
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (05) : 673 - 675
  • [49] X-ray absorption spectroscopy study of FePt thin films
    Martins, A.
    Souza-Neto, N. M.
    Fantini, M. C. A.
    Santos, A. D.
    Prado, R. J.
    Ramos, A. Y.
    JOURNAL OF APPLIED PHYSICS, 2006, 100 (01)
  • [50] X-RAY PHOTOELECTRON SPECTROSCOPY STUDY OF SUPPORTED TUNGSTEN OXIDE
    BILOEN, P
    POTT, GT
    JOURNAL OF CATALYSIS, 1973, 30 (02) : 169 - 174