ION-BEAM PROCESSING OF III-V SEMICONDUCTORS

被引：0
|
作者：
WEBB, AP [1 ]
机构：
[1] PLESSEY RES CASWELL LTD,TOWCESTER NN12 8EO,NORTHANTS,ENGLAND
来源：
VACUUM | 1988年 / 38卷 / 8-10期
关键词：
D O I：
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中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
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页码：948 / 948
页数：1
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