INDIUM INCORPORATION IN GAINAS/GAAS QUANTUM-WELLS GROWN ON GAAS

被引:9
|
作者
WOODBRIDGE, K [1 ]
MOORE, KJ [1 ]
ANDREW, NL [1 ]
FEWSTER, PF [1 ]
机构
[1] PHILIPS RES LABS,REDHILL RH1 5HA,SURREY,ENGLAND
关键词
D O I
10.1016/0022-0248(91)90997-J
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We report RHEED studies on the growth of GaInAs on GaAs over a range of, growth conditions. Above about 550-degrees-C there is a steady fall in In incorporation and a temperature-dependent reconstruction change from an As stable 2 x 4 to an In stable 4 x 2. Recovery time data indicate that the In surface concentration is highest at 560-degrees-C and decreases at higher temperatures due to increasing re-evaporation rate. An upturn in recovery time at longer deposition times and lower temperatures may be due to strain limited incorporation. Compositional homogeneity of GaInAs/GaAs quantum wells grown with full and partial In incorporation show marked differences which are discussed in relation to the above results.
引用
收藏
页码:339 / 343
页数:5
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