SIMILARITY OF THE LASER-ANNEALED AND THERMALLY ANNEALED SI(111) SURFACES

被引：50
|
作者：
ZEHNER, DM [1 ]
WHITE, CW [1 ]
HEIMANN, P [1 ]
REIHL, B [1 ]
HIMPSEL, FJ [1 ]
EASTMAN, DE [1 ]
机构：
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
来源：
PHYSICAL REVIEW B | 1981年 / 24卷 / 08期
关键词：
D O I：
10.1103/PhysRevB.24.4875
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：4875 / 4878
页数：4
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