DEPOSITION OF EPITAXIAL LAYERS BY ION-BEAM METHODS

被引：16
|
作者：
WEISSMANTEL, C
HECHT, G
HINNEBERG, HJ
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1980年 / 17卷 / 04期
关键词：
Compilation and indexing terms; Copyright 2025 Elsevier Inc;
D O I：
10.1116/1.570566
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：812 / 816
页数：5
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