FLUOROCARBON SOLUTIONS AT LOW TEMPERATURES .2. THE LIQUID MIXTURES C2H6-C2F6, C2F6-CHF3, CH2F2-CHF3, C2H6-CHF3 AND XE-CHF3

被引:22
|
作者
THORP, N
SCOTT, RL
机构
来源
JOURNAL OF PHYSICAL CHEMISTRY | 1956年 / 60卷 / 10期
关键词
D O I
10.1021/j150544a027
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
引用
收藏
页码:1441 / 1443
页数:3
相关论文
共 50 条
  • [1] Particulates in C(2)F(6)-CHF(3) and CF(4)-CHF(3) etching plasmas
    Anderson, Harold M.
    Radovanov, Svetlana
    Mock, Joseph L.
    Resnick, Paul J.
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 1994, 3 (03): : 302 - 309
  • [2] DOUBLE IONIZATION ENERGIES OF THE FLUOROETHANE MOLECULES C2H5F, CH3CHF2, CH2FCHF2, CH3CF3, CHF2CF3 AND C2F6 MEASURED BY DOUBLE-CHARGE-TRANSFER SPECTROSCOPY
    GRIFFITHS, WJ
    HARRIS, FM
    JOURNAL OF THE CHEMICAL SOCIETY-FARADAY TRANSACTIONS II, 1989, 85 : 1575 - 1584
  • [3] XPS ANALYSIS OF SI AND SIO2 SURFACES EXPOSED TO CHF3 AND CHF3-C2F6 PLASMAS - POLYMERIZATION AND ETCHING
    CARDINAUD, C
    RHOUNNA, A
    TURBAN, G
    GROLLEAU, B
    REVUE DE PHYSIQUE APPLIQUEE, 1989, 24 (03): : 309 - 321
  • [4] A microporous framework with aromatic pores for one-step purification of C2F6 from CF3CH2F/CF3CHF2/C2F6 mixture
    Zhu, Yongqin
    Zhou, Yunzhe
    Ji, Zhenyu
    Zhang, Wenjing
    Wu, Mingyan
    SEPARATION AND PURIFICATION TECHNOLOGY, 2025, 353
  • [5] FLUOROCARBON SOLUTIONS AT LOW TEMPERATURES .4. LIQUID MIXTURES CH4 + CCIF3 CH2F2 + CCIF3 CHF3 + CCIF3 CF4 + CCIF3 C2H6 + CCIF3 C2H6 + CF4 + CHF3 + CF4
    CROLL, IM
    SCOTT, RL
    JOURNAL OF PHYSICAL CHEMISTRY, 1964, 68 (12): : 3853 - &
  • [6] CALCULATION OF C=C AND C-F BOND LENGTHS IN CH2=CH2, CH2=CHF, CIS-CHF=CHF, AND CH2=CF2
    BAK, B
    KIERKEGA.C
    PAPPAS, J
    SKAARUP, S
    ACTA CHEMICA SCANDINAVICA, 1973, 27 (01): : 363 - 364
  • [7] LIQUID MOLAR VOLUMES OF CH2FCF3, CH3CCLF2, AND CH3CHF2 AND THE MIXTURES CHF2CL+CH3CCLF2 AND CHF2CL+CH3CHF2
    STROM, KHU
    GREN, UB
    JOURNAL OF CHEMICAL AND ENGINEERING DATA, 1993, 38 (01): : 18 - 22
  • [8] Ion and neutral species in C2F6 and CHF3 dielectric etch discharges
    Jayaraman, R
    McGrath, RT
    Hebner, GA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1999, 17 (04): : 1545 - 1551
  • [10] Critical properties of CO2, CHF3, SF6, (CO2+CHF3), and (CHF3+SF6)
    Diefenbacher, A
    Crone, M
    Turk, M
    JOURNAL OF CHEMICAL THERMODYNAMICS, 1998, 30 (04): : 481 - 496