HETEROEPITAXIAL SI/AL2O3/SI STRUCTURES

被引：44
|
作者：
ISHIDA, M [1 ]
SAWADA, K [1 ]
YAMAGUCHI, S [1 ]
NAKAMURA, T [1 ]
SUZAKI, T [1 ]
机构：
[1] TOYOKO KAGAKU CO LTD,NAKAHARA KU,KAWASAKI 211,JAPAN
来源：
APPLIED PHYSICS LETTERS | 1989年 / 55卷 / 06期
关键词：
D O I：
10.1063/1.102434
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：556 / 558
页数：3
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