GAAS GROWTH USING TERTIARYBUTYLARSINE AND TRIMETHYLGALLIUM

被引:50
|
作者
LARSEN, CA [1 ]
BUCHAN, NI [1 ]
LI, SH [1 ]
STRINGFELLOW, GB [1 ]
机构
[1] UNIV UTAH,DEPT ELECT ENGN,SALT LAKE CITY,UT 84112
关键词
This work was supportedb y a grant from the US Air Force; C ontracNt o. AFOSR-87-0233T. he authorsw ish to thank AmericanC yanamidC om-pany for supplyingth e tertiarybutylarsine;
D O I
10.1016/0022-0248(88)90499-X
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
11
引用
收藏
页码:15 / 19
页数:5
相关论文
共 50 条
  • [41] THE REACTION OF TRIETHYLGALLIUM AND TRIMETHYLGALLIUM WITH GAAS(100)
    BANSE, BA
    CREIGHTON, JR
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1991, 201 : 288 - COLL
  • [42] SITES FOR TRIMETHYLGALLIUM ADSORPTION ON GAAS(001)
    GEE, PE
    QI, HH
    HICKS, RF
    SURFACE SCIENCE, 1995, 330 (02) : 135 - 146
  • [43] Dynamical properties of tertiarybutylarsine on GaAs(001) surface
    Ozeki, M
    Ohashi, M
    Tanaka, Y
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2002, 193 : 485 - 489
  • [44] Quality improvement of GaInNAs/GaAs quantum wells grown by MOCVD using tertiarybutylarsine
    Pan, Z
    Miyamoto, T
    Schlenker, D
    Koyama, F
    Iga, K
    1998 INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE AND RELATED MATERIALS - CONFERENCE PROCEEDINGS, 1998, : 135 - 138
  • [45] MONOETHYLARSINE AS A NOVEL REPLACEMENT FOR UNPRECRACKED ARSINE SOURCE IN THE CHEMICAL BEAM EPITAXIAL-GROWTH OF GAAS USING TRIMETHYLGALLIUM AND TRIETHYLGALLIUM
    PARK, SJ
    RO, JR
    SIM, JK
    LEE, EH
    JOURNAL OF CRYSTAL GROWTH, 1994, 136 (1-4) : 138 - 142
  • [46] GROWTH CONDITION DEPENDENCE OF CARBON-REDUCTION IN GAAS CHEMICAL BEAM EPITAXY USING TRISDIMETHYLAMINO-ARSINE AND TRIMETHYLGALLIUM
    ISHIKURA, K
    TAKEUCHI, A
    KURIHARA, M
    MACHIDA, H
    HASEGAWA, F
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1994, 33 (4A): : L494 - L496
  • [47] Trimethylgallium supply without the use of bubbling in GaAs growth by metalorganic vapor phase epitaxy
    Ohuchi, Atsushi
    Ohno, Hideo
    Ohtsuka, Shunsuke
    Hasegawa, Hideki
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1988, 27 (12):
  • [48] Movpe growth of GaNAs using tertiarybutylarsine (TBA) and dimethylhydrazine (DMHy)
    Moto, A
    Tanaka, S
    Ikoma, N
    Tanabe, T
    1998 INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE AND RELATED MATERIALS - CONFERENCE PROCEEDINGS, 1998, : 139 - 142
  • [49] HREELS STUDY OF TRIMETHYLGALLIUM AND ARSINE ON GAAS(100)
    ZHU, XY
    WHITE, JM
    CREIGHTON, JR
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1991, 202 : 65 - COLL
  • [50] ATOMIC LAYER EPITAXY OF GAAS FROM TERTIARYBUTYLARSINE AND TRIETHYLGALLIUM
    AITLHOUSS, M
    CASTANO, JL
    GARCIA, BJ
    PIQUERAS, J
    JOURNAL OF APPLIED PHYSICS, 1995, 78 (09) : 5834 - 5836