LITHOGRAPHY AND RADIATION-CHEMISTRY OF EPOXY CONTAINING NEGATIVE ELECTRON RESISTS

被引:61
|
作者
THOMPSON, LF [1 ]
FEIT, ED [1 ]
HEIDENRE.RD [1 ]
机构
[1] BELL TEL LABS INC,MURRAY HILL,NJ 07914
来源
POLYMER ENGINEERING AND SCIENCE | 1974年 / 14卷 / 07期
关键词
D O I
10.1002/pen.760140713
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
引用
收藏
页码:529 / 533
页数:5
相关论文
共 50 条
  • [1] RADIATION-CHEMISTRY OF PHENOLIC RESIN CONTAINING EPOXY AND AZIDE COMPOUNDS
    SHIRAISHI, H
    UENO, T
    SUGA, O
    NONOGAKI, S
    [J]. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1984, 187 (APR): : 98 - POLY
  • [2] RADIATION-CHEMISTRY OF PHENOLIC RESIN CONTAINING EPOXY AND AZIDE COMPOUNDS
    SHIRAISHI, H
    UENO, T
    SUGA, O
    NONOGAKI, S
    [J]. ACS SYMPOSIUM SERIES, 1984, 266 : 423 - 434
  • [3] THE RADIATION-CHEMISTRY OF POLY(METHYL METHACRYLATE) POLYMER RESISTS
    LEHOCKEY, EM
    REID, I
    HILL, I
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (04): : 2221 - 2225
  • [4] RADIATION-CHEMISTRY OF POLY(LACTIDES) AS NEW POLYMER RESISTS FOR THE LIGA PROCESS
    WOLLERSHEIM, O
    ZUMAQUE, H
    HORMES, J
    LANGEN, J
    HOESSEL, P
    HAUSSLING, L
    HOFFMANN, G
    [J]. JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 1994, 4 (02) : 84 - 93
  • [5] Scanning Probe Lithography with Negative and Positive Electron Beam Resists
    Anggraini, Lydia
    Tanaka, Bungo
    Matsuzuka, Naoki
    Isono, Yoshitada
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 2013, 52 (05)
  • [6] Study on lithography of negative resists
    Dong, Xiaochun
    Du, Chunlei
    [J]. Guangzi Xuebao/Acta Photonica Sinica, 2003, 32 (12):
  • [7] RADIATION-CHEMISTRY AND BIORADICAL CHEMISTRY
    FERRADINI, C
    [J]. JOURNAL DE CHIMIE PHYSIQUE ET DE PHYSICO-CHIMIE BIOLOGIQUE, 1991, 88 (06) : 873 - 887
  • [8] BIBLIOGRAPHIES ON RADIATION-CHEMISTRY .8. RADIATION-CHEMISTRY OF CRYSTALLINE ICE
    GILLIS, HA
    CARMICHAEL, I
    [J]. RADIATION PHYSICS AND CHEMISTRY, 1983, 22 (06): : 981 - 987
  • [9] DUV resists in negative tone high resolution electron beam lithography
    van Delft, FCMJM
    Holthuysen, FG
    [J]. MICROELECTRONIC ENGINEERING, 1999, 46 (1-4) : 383 - 387
  • [10] RADIATION-CHEMISTRY OF POLYMERS
    ODONNELL, JH
    [J]. ACS SYMPOSIUM SERIES, 1989, 381 : 1 - 13