NOISE MEASUREMENTS IN ELECTRON-BEAM-EVAPORATED AMORPHOUS SILICON THIN-FILMS

被引:2
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作者
NEUDECK, GW
KRIEGEL, MH
机构
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D O I
10.1016/0040-6090(78)90037-8
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T [工业技术];
学科分类号
08 ;
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页码:209 / 215
页数:7
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