MAGNETIC-SUSCEPTIBILITIES OF VSI2, NBSI2 AND TASI2 SINGLE-CRYSTALS

被引:19
|
作者
GOTTLIEB, U
SULPICE, A
MADAR, R
LABORDE, O
机构
[1] INST NATL POLYTECHN GRENOBLE,ECOLE NATL SUPER PHYS GRENOBLE,MAT & GEN PHYS LAB,F-38402 ST MARTIN DHERES,FRANCE
[2] CNRS,SERV NATL CHAMPS INTENSES,F-38042 GRENOBLE,FRANCE
关键词
D O I
10.1088/0953-8984/5/46/013
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
We report magnetic susceptibility measurements on single crystals of very-high-purity VSi2, NbSi2 and TaSi2 from 4 K to room temperature. VSi2 is paramagnetic while NbSi2 and TaSi2 are diamagnetic. A systematic anisotropy of chi is observed for the three compounds. The results are in good agreement with previous investigations of the electronic properties of these materials. The different contributions of chi which account for these data are discussed.
引用
收藏
页码:8755 / 8762
页数:8
相关论文
共 50 条
  • [1] Electron-phonon interaction spectra of TaSi2, NbSi2 and VSi2
    Balkashin, OP
    Jansen, AGM
    Gottlieb, U
    Laborde, O
    Madar, R
    [J]. SOLID STATE COMMUNICATIONS, 1996, 100 (05) : 293 - 296
  • [2] OPTICAL AND ELECTRICAL CHARACTERIZATION OF VSI2 AND NBSI2 SINGLE-CRYSTALS
    GUIZZETTI, G
    MARABELLI, F
    BORGHESI, A
    NAVA, F
    GOTTLIEB, U
    LABORDE, O
    [J]. APPLIED SURFACE SCIENCE, 1993, 73 : 237 - 242
  • [3] LOW-TEMPERATURE SPECIFIC-HEAT OF VSI2, NBSI2, AND TASI2
    LASJAUNIAS, JC
    LABORDE, O
    GOTTLIEB, U
    MADAR, R
    THOMAS, O
    [J]. JOURNAL OF LOW TEMPERATURE PHYSICS, 1993, 92 (5-6) : 335 - 351
  • [4] LOW-TEMPERATURE SPECIFIC-HEAT MEASUREMENTS OF VSI2, NBSI2, AND TASI2
    GOTTLIEB, U
    LASJAUNIAS, JC
    LABORDE, O
    THOMAS, O
    MADAR, R
    [J]. APPLIED SURFACE SCIENCE, 1993, 73 : 232 - 236
  • [5] Some properties of the phonon spectra of transition metal disilicides VSi2, NbSi2, and TaSi2
    Laborde, O
    Bossy, J
    Affronte, M
    Schober, H
    Gottlieb, U
    [J]. SOLID STATE COMMUNICATIONS, 2003, 126 (07) : 415 - 419
  • [6] Chiral-Structure-Driven Split Fermi Surface Properties in TaSi2, NbSi2, and VSi2
    Onuki, Yoshichika
    Nakamura, Ai
    Uejo, Taro
    Teruya, Atsushi
    Hedo, Masato
    Nakama, Takao
    Honda, Fuminori
    Harima, Hisatomo
    [J]. JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 2014, 83 (06)
  • [7] RESISTIVITY AND MAGNETORESISTANCE OF MONOCRYSTALLINE TASI2 AND VSI2
    GOTTLIEB, U
    LABORDE, O
    THOMAS, O
    WEISS, F
    ROUAULT, A
    SENATEUR, JP
    MADAR, R
    [J]. SURFACE & COATINGS TECHNOLOGY, 1991, 45 (1-3): : 237 - 243
  • [8] Plastic deformation of single crystals of VSi2 and TaSi2 with the C40 structure
    Inui, H
    Moriwaki, M
    Yamaguchi, M
    [J]. INTERMETALLICS, 1998, 6 (7-8) : 723 - 728
  • [9] First-principles exploration of elastic anisotropy and thermal properties of the C40-type VSi2, NbSi2, and TaSi2 disilicides
    Wu, Yuyu
    Yang, Chen
    Duan, Yonghua
    [J]. MATERIALS TODAY COMMUNICATIONS, 2021, 29 (29):
  • [10] GROWTH KINETICS OF VSI2 AND NBSI2 THIN-FILMS
    WAGNER, RJ
    LAU, SS
    MAYER, JW
    ROTH, JA
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (08) : C287 - C287