X-RAY-SCATTERING TOPOGRAPHY OF METALLIC MULTILAYER FILMS

被引：0
|
作者：
SHINOZAKI, T
HONDOH, T
GOTO, A
TAKAHASHI, A
TAKAMA, T
YAMAGUCHI, A
YAMAMOTO, R
机构：
[1] HOKKAIDO UNIV,INST LOW TEMP SCI,N19W8,SAPPORO,HOKKAIDO 060,JAPAN
[2] HOKKAIDO UNIV,DEPT APPL PHYS,SAPPORO,HOKKAIDO 060,JAPAN
[3] UNIV TOKYO,INST IND SCI,TOKYO 106,JAPAN
来源：
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 1993年 / 126卷 / 1-3期
关键词：
D O I：
10.1016/0304-8853(93)90538-D
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
X-ray scattering topography has been applied to sputtered Co/Au multilayer films in order to clarify structural inhomogeneities along the film surface. The observed difference in the main peak intensities was larger than 20%, but with almost constant integrated intensities. A model for the film structures is discussed in terms of the distribution of crystal sizes and orientations.
引用
收藏
页码：34 / 37
页数：4
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