ION-INDUCED SILICIDE FORMATION IN NIOBIUM THIN-FILMS

被引：99
|
作者：
MATTESON, S
ROTH, J
NICOLET, MA
机构：
来源：
RADIATION EFFECTS AND DEFECTS IN SOLIDS | 1979年 / 42卷 / 3-4期
关键词：
D O I：
10.1080/00337577908209140
中图分类号：
TL [原子能技术]; O571 [原子核物理学];
学科分类号：
0827 ; 082701 ;
摘要：
引用
收藏
页码：217 / 226
页数：10
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