SPATIAL-DISTRIBUTION OF OXYGEN IN LUMINESCENT POROUS SILICON FILMS

被引：13
|
作者：
TESCHKE, O
机构：
[1] Instituto de Fisica, UNICAMP
来源：
APPLIED PHYSICS LETTERS | 1994年 / 64卷 / 15期
关键词：
D O I：
10.1063/1.111715
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Transmission electron microscopy associated with electron energy loss spectroscopy imaging was used to determine structural spatial variations and compositional variation in heavily doped (0.006 OMEGA cm) and lightly doped (0.4 OMEGA cm) luminescent porous silicon films.
引用
收藏
页码：1986 / 1988
页数：3
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