SURFACE EXTENDED X-RAY ABSORPTION FINE-STRUCTURE OF COPPER ON A PLATINUM-ELECTRODE

被引：0

作者：

FURTAK, TE ^{[1
]}

WANG, L ^{[1
]}

CREEK, EA ^{[1
]}

SAMANTA, P ^{[1
]}

HAYES, TM ^{[1
]}

KENDALL, G ^{[1
]}

LI, W ^{[1
]}

LIANG, G ^{[1
]}

LO, CM ^{[1
]}

机构：

[1] RENSSELAER POLYTECH INST, DEPT PHYS, TROY, NY 12180 USA

来源：

ELECTROCHIMICA ACTA | 1991年 / 36卷 / 11-12期

关键词：

X-RAY ABSORPTION; UNDERPOTENTIAL DEPOSITION; PLATINUM; COPPER;

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

We have measured EXAFS from a Cu monolayer adsorbed on a Pt electrode while the sample was under electrochemical control. The experiment exploits high intensity tunable X-rays, grazing incidence on a large surface (55 cm2), and fluorescence detection using a custom ion chamber. The data indicate that the first neighbor to Cu in the plane parallel to surface is most probably oxygen at 1.98 angstrom. Second neighbors are either Cu at 2.59 angstrom or oxygen at 2.55 angstrom.

引用

页码：1863 / 1868

页数：6

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