The reactions of photographic materials to light

被引：3

作者：

Sheppard, SE ^{[1
]}

机构：

[1] Eastman Kodak Co, Rochester, NY USA

来源：

INDUSTRIAL AND ENGINEERING CHEMISTRY | 1930年 / 22卷

关键词：

D O I：

10.1021/ie50245a037

中图分类号：

O69 [应用化学];

学科分类号：

081704 ;

摘要：

引用

页码：555 / 563

页数：9

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