EMISSION SPECTRUM OF A CHEMICAL LASER USING AN H2 +F2 MIXTURE

被引：0

|

作者：

BASOV, NG

KULAKOV, LV

MARKIN, EP

NIKITIN, AI

ORAEVSKII, AN

机构：

来源：

JETP LETTERS-USSR | 1969年 / 9卷 / 11期

关键词：

D O I：

暂无

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

收藏

页码：375 / +

页数：1

相关论文

共 50 条

[21] RADIATION-CHEMICAL LASER USING SF6 + H2 AND CCL2F2 + H2 MIXTURES AT PRESSURES UP TO 3 ATM
DOVBYSH, LE
ZAVADA, NI
KAZAKEVICH, AT
KARPIKOV, AA
MELNIKOV, SP
PODMOSHENSKII, IV
SINYANSKII, AA
[J]. JETP LETTERS, 1974, 20 (06) : 183 - 184
[22] H2在F2内燃烧反应机理探讨
高志崇
于瑞生
[J]. 聊城大学学报(自然科学版), 2003, (01) : 49 - 51
[23] EXPERIMENTS ON HYDROGEN RECOMBINATION IN NOZZLE FLOWS FOR H2/F2 SYSTEM
KUBY, WC
[J]. AIAA JOURNAL, 1966, 4 (01) : 160 - &
[24] STUDIES ON HF RELAXATION AND ON REACTION OF H2 WITH F2 BEHIND SHOCKS
JUST, T
RIMPEL, G
[J]. IEEE JOURNAL OF QUANTUM ELECTRONICS, 1973, QE 9 (01) : 196 - &
[25] STUDY OF KINETICS OF REACTION BETWEEN H2 AND F2 BY EPR METHODS
RABIDEAU, SW
HECHT, HG
LEWIS, WB
[J]. JOURNAL OF MAGNETIC RESONANCE, 1972, 6 (03) : 384 - +
[26] Emission of a pulsed purely rotational transition chemical H2-F2 laser
Molevich, N. E.
Pichugin, S. Yu.
[J]. QUANTUM ELECTRONICS, 2008, 38 (04) : 330 - 332
[27] QUALITATIVE INVESTIGATION OF ENERGY BRANCHING IN H2(D2)+F2 REACTION
VASILIEV, GK
MAKAROV, EF
CHERNYSHEV, IA
[J]. DOKLADY AKADEMII NAUK SSSR, 1977, 233 (06): : 1118 - 1121
[28] Photochemical modification of silicone films using F2 laser for selective chemical etching
[J]. Okoshi, M. (okoshi@nda.ac.jp), 1600, Japan Society of Applied Physics (43):
[29] Photochemical modification of silicone films using F2 laser for selective chemical etching
Okoshi, M
Kimura, T
Takao, H
Inoue, N
Yamashita, T
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2004, 43 (6A): : 3438 - 3442
[30] EFFECT OF VIBRATIONAL AND ROTATIONAL RELAXATION MECHANISMS IN PULSED H2 + F2 LASERS
BROWN, RC
KERBER, RL
[J]. APPLIED OPTICS, 1984, 23 (13) : 2078 - 2087

← 1 2 3 4 5 →