RESOLUTION LIMITS OF OPTICAL LITHOGRAPHY

被引：120
|
作者：
OKAZAKI, S
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1991年 / 9卷 / 06期
关键词：
D O I：
10.1116/1.585650
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The development of optical lithography has promoted the development of ultralarge scale integration (ULSI) devices. However, optical lithography is now facing serious obstacles due to the limitations in wavelength. Higher resolution with sufficient depth of focus is the most important requirement for ULSI engineers. To satisfy this requirement, many technologies for resolution improvement and new optical image formation technologies such as phase shifting and focus latitude enhancement exposure (FLEX) are reviewed, and a future perspective on optical lithography is also discussed in this paper.
引用
收藏
页码：2829 / 2833
页数：5
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