INFLUENCE OF DEPOSITION CONDITIONS ON PROPERTIES OF A-SIGE-H PREPARED BY MICROWAVE-EXCITED PLASMA CVD

被引：7
|
作者：
WATANABE, T
AZUMA, K
TANAKA, M
NAKATANI, M
SONOBE, T
SHIMADA, T
机构：
[1] HITACHI LTD,HITACHI WORKS,HITACHI,IBARAKI 317,JAPAN
[2] HITACHI LTD,CENT RES LAB,KOKUBUNJI,TOKYO 185,JAPAN
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1988年 / 27卷 / 07期
关键词：
D O I：
10.1143/JJAP.27.1126
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1126 / 1131
页数：6
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