SURFACE CHARACTERIZATION WITH SCANNING PROBE MICROSCOPY

被引:0
|
作者
ZHOU, L [1 ]
CHRISTIE, B [1 ]
机构
[1] TOPOMETRIX CORP,DEPT MKT SERV,SANTA CLARA,CA
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Scanning probe microscopy (SPM) is used in imaging and metrology applications for both the semiconductor and disk drive industries. SPM provides quantitative, 3-D data in environments as simple as ambient air or as complex as temperature-controlled samples and vacuum stages. Unlike with scanning electron microscopy (SEM), sample preparation is minimal. A wafer can be placed on the SPM stage and scanned within minutes. New scanning tips have helped SPM evolve into more than a high-magnification tool for obtaining topographic information. The same instrument can measure surface roughness on the angstrom level. SPM can acquire and display surface properties, such as frictional force, magnetic force, electrical potential, and surface compliance. Extremely high-aspect ratio probes allow imaging in steep trenches.
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页码:57 / &
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